Nano/Micro Photolithography Systems
Stepper / Mask Aligner / 3D Micro-Printer
Technical Specifications ( Model: MA1100 ):
(1) High Precision
(2) Submicron Resolution and Overlay
(3) Manual Mask Aligner
(4) The wafer stage compensation
(5) Semi-automatic wafer adjustment in 3D translation and rotation
(6) MA1100 for 6-inch photo mask and 4-inch wafer/glass.
Customized for 6-10 inch mask or wafer.
(7) Sophisticated Exposure Optics (New)
(8) Sensitive Imaging System
(9) Space saving, Desktop (New)
(10) Built-in computer systems
(11) Automatically back to the initial middle points of the wafer stage
(12) Customized hardware and software to fulfill industry needs
(13) Versatile for Various Substrates/Shapes. (Silicon Wafer, Glass,...etc.)
WEISTRON Mask Aligner System Test Report ( Model: MA1100 ) :
